Silicon Wafer Analysis
Accurate and Efficient Contaminant Analysis in Silicon Wafer Manufacturing
Agilent instruments, incorporating a new generation of ultimate sensitivity technology, are helping semiconductor manufacturers measure and minimize contamination at every level of the production process. Our 7700 ORS technology, and the industry-leading 8800 ICP-MS/MS instrument, precisely and efficiently measure the type, source, and level of metallic impurities during each stage of wafer fabrication, in even the highest matrix environments.
Detecting trace contaminants efficiently is important in order to maintain manufacturing yields, and our automated sample handling and data processing tools help ensure this. Chemical analysis is also carried out in a direct process ensuring a reduced risk of contamination during testing. In addition, all equipment is backed up by Agilent’s exceptional support structure for silicon wafer fabricators delivered by experienced engineers.
Ultratrace Analysis of Solar (Photovoltaic) Grade Bulk Silicon by ICP-MS
- PDF/ Found In: Application Notes
- Date : 20 Jan 2014
- File Size : 75.77 KB
Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS
- PDF/ Found In: Application Notes
- Date : 18 Jan 2006
- File Size : 85.65 KB
- Application Notes
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Measuring Inorganic Impurities in Semiconductor Manufacturing
A guide to the applications of ICP-MS in the semiconductor industry, including the control of metal contaminants.
- Application Notes
- English
- 03 Sep 2018
- 3.25 MB
Trace elemental analysis of trichlorosilane by Agilent 7700s/7900 ICP-MS
Metallic impurities in trichlorosilane (TCS), an intermediate product used in the production of photovoltaic (PV) silicon, must be strictly controlled in order to produce...
- Application Notes
- English
- 09 Oct 2017
- 430.08 KB
Direct analysis of trace metallic impurities in high purity hydrochloric acid by Agilent 7700s/7900 ICP-MS
Illustrates the advanced analytical performance and robustness of the Agilent 7700s/7900 ICP-MS for the direct determination of metallic impurities in high purity concentrated HCl.
- Application Notes
- English
- 09 Oct 2017
- 446.89 KB
Determination of trace elements in isopropyl alcohol using an Agilent 4200 MP-AES with External Gas Control Module
Analyzing the purity of isopropyl via Microwave Plasma Atomic Emission Spectroscopy (MP-AES).
- Application Notes
- English
- 16 Jul 2015
- 347.50 KB
Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS
Application note for Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS
- Application Notes
- English
- 18 Jan 2015
- 1.40 MB
Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples
Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples
- Application Notes
- English
- 27 Jan 2014
- 773.59 KB
Trace anion determination in semiconductor grade H202 by CE
Application note for trace anion determination in semiconductor grade H202 by CE
- Application Notes
- English
- 21 Jan 2014
- 165.00 KB
Ultratrace Analysis of Solar (Photovoltaic) Grade Bulk Silicon by ICP-MS
A new quantitative method for the determination of ultratrace elemental impurities present in photovoltaic grade silicon is described using the Agilent 7500cs ICP-MS
- Application Notes
- English
- 20 Jan 2014
- 75.77 KB
Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS
Application note for Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS
- Application Notes
- English
- 09 Jul 2013
- 1022.22 KB
Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS
Application note for Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS
- Application Notes
- English
- 17 Feb 2014
- 937.74 KB
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7900 ICP-MS 视频
- 00:02:40
- 17 Dec 2013